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Machining Technology of Ultrasonic Assisted Grinding for a Silicon Carbide Wafer Carrier

机译:用于碳化硅晶圆载体的超声波辅助研磨的加工技术

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The machining technology of ultrasonic assisted ductile mode grinding for the silicon carbide (SiC) wafer carrier. The machining tool is designed and analyzed by ANASYS 14.0 and the machining technology is studied for the 6-inch SiC wafer carrier. The ultrasonic tool holder with the resonance frequency 26 kHz is designed and fabricated. The advantageous machining parameters are proposed that spindle rotation rate is 3000 rpm, feed speed is 200 mm/min, and ultrasonic output power is 250 W. The measurement results show that the average roughness (Ra) of the SiC is 0.18μm, the MRR is over 2.4 mm~3/min, the tool tips are only minor abrasion, and the cutting temperature are reduced. Obvious, the machining technology has the advantage of high surface quality, high machining efficiency and long tool life.
机译:碳化硅(SiC)晶片载体的超声辅助延展岩模拟加工技术。通过Anasys 14.0设计和分析加工工具,对6英寸SiC晶片载体研究加工技术。设计和制造具有共振频率26 kHz的超声波刀架。提出了有利的加工参数,提出主轴旋转速率为3000rpm,进料速度为200mm / min,而超声波输出功率为250W。测量结果表明,SiC的平均粗糙度(Ra)为0.18μm,MRR为0.18μm超过2.4毫米〜3 / min,工具尖端仅稍微磨损,切割温度降低。显而易见的是,加工技术具有高表面质量,高加工效率和长工具寿命的优势。

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