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Investigation of resistance in n-doped Si wires using NEGF formalism

机译:negf形式主义对N掺杂Si线耐药性的研究

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In this work we use a full 3D Non-Equilibrium Green Function formalism in the effective mass approximation to calculate the resistance and resistivity of a thin silicon nanowire transistor and a doped silicon nanowire. The Non-Equilibrium green function equations are solved self-consistent with the Poisson equation. The resistances are calculated by averaging the resulting currents from an ensemble of wires and transistors. The number and spatial location of the discrete dopants differ for each device in the ensemble. The calculated resistivities agree with the bulk resistivity corresponding to the average dopant concentration used in our simulations to generate the profiles of discrete dopants.
机译:在这项工作中,我们在有效质量近似下使用完整的3D非平衡绿色功能形式主义来计算薄硅纳米线晶体管和掺杂硅纳米线的电阻和电阻率。非平衡绿色函数方程与泊松方程求解自符合。通过从电线和晶体管的集合来平均所得到的电流来计算电阻。离散掺杂剂的数量和空间位置对于集合中的每个设备而异。计算的电阻率与对应于我们模拟中使用的平均掺杂剂浓度的大量电阻率,以产生离散掺杂剂的曲线。

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