Flexible Sensitivity Inspection with TK-CMI Software forCriticality-Awareness

摘要

In this paper we present the method that NuFlare photomask inspection systems can use to strongly reducepseudo detections by use of TK-CMI software. The NuFlare inspection system is capable to detect thesmallest defects in the 45 and 32-nm nodes and has recently been introduced to production. It links up witha compute cluster with Takumi's Criticality-Marker Information software (TK-CMI). TK-CMI quickly analyzesthe~200GB post-OPC layout or multi-layer pre-OPC layout and assigns various types of criticality regions.The basic set of criticalities is made to address the challenges that typical maskmakers experience. The TK-CMI system also supports design-intent-based criticalities. The NuFlare inspection system uses this full-maskcriticality information and generates flexible inspection recipes that inspect low-criticality areas with relaxedsensitivity resulting in reduction of pseudo detections in such regions.