Benchmark of Rigorous Methodsfor Electromagnetic Field Simulations

摘要

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations withthe simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO. Withthe combined tools we investigate the convergence of near-field and far-field results for different DUV masks.We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and withthe finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolatedhole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 micronsby 10 microns.