Evaluation of E-Beam Repair for Nanoimprint Templates

摘要

Two essential process steps of the template fabrication chain are inspection and repair. The widely introduced gasassisted e-beam etching and deposition technique for mask repair offers crucial advantages, especially regarding theresolution capability. We started the evaluation of a new e-beam repair test stand based on the Zeiss MeRiT technologyfor UV-NIL template repair. For this purpose, templates with programmed defects of different shapes and sizes havebeen designed and fabricated. The repair experiments were focused on the development of recipes for quartz etching anddeposition specifically tailored for NIL repair requirements Both, clear and opaque programmed defects have beenrepaired and the results have been analyzed. After recipe optimization, templates with repaired programmed defects havebeen imprinted on a Molecular Imprints Imprio 250 tool. By comparing template and imprint results we investigated therepair capability.