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Fabrication, measurement and tuning of a photonic crystal H1-cavity in deeply etched InP/InGaAsP/InP

机译:光子晶体H1腔的制造,测量和调谐在深度蚀刻的INP / INGAASP / INP中的光子晶体H1腔

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摘要

A point defect cavity (H1) was fabricated by deep etching in the InP/InGaAsP/InP system. The optical properties of the devices were experimentally investigated by transmission spectroscopy yielding a Q-factor of ∼65. The resonance frequency of the defect cavity was shifted, by infiltrating the surrounding holes with both a polymer and liquid crystal. Furthermore, the transmission was enhanced by a factor ≪ 5 as a result of the filling.
机译:通过在INP / INGAASP / INP系统中深蚀刻来制造点缺陷腔(H1)。通过透射光谱进行实验研究了器件的光学性质,得到〜65的Q因子。通过用聚合物和液晶渗透周围孔来偏移缺陷腔的共振频率。此外,由于填充结果,通过因子«5增强了变速器。

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