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The semiconductor - dielectric interface from PN junction periphery and its influence on reliability of power devices at high temperature

机译:来自PN结周边的半导体介电接口及其对高温电力装置可靠性的影响

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Data sheets of commercial power semiconductor devices and modules available at this time on the market indicate a maximum permissible junction temperature specified in a range of 125 –200°C. Operation above the specified value is not possible without risk of device failure, although this is desirable in emerging power electronics applications. Typical device blocking electrical characteristics at high junction temperature are presented and analyzed. A portion of blocking current-voltage characteristic given by a PN junction at reverse bias voltage can be fitted to linear variation. At higher applied voltage towards the breakdown region deviation from linear variation is exhibited. By increasing the junction temperature from 150 °C towards 200 °C and above this value, the portion of the current-voltage characteristic exhibiting linear variation becomes more reduced. If the applied voltage reaches the portion of electrical characteristic with deviation from linear variation towards the breakdown region, thermal instability of the characteristic is developed in short time. Device failure is possible if the applied voltage is not suppressed. Analysis of failed devices operated in such conditions indicates excessive high current or even electrical short-circuit for PN junctions at reverse applied voltage. It is shown that such behavior is due to a spot of material degradation located at the junction periphery. Most of leakage current flow in a thin interfacial layer between the semiconductor material and the passivating dielectric material from the junction edge accounts for many device failures during operation at high temperature.
机译:在市场上此时可用的商业电力半导体器件和模块的数据表表示最大允许结温,范围为125 -200°C。在没有设备故障的情况下,不可能在指定值上方的操作,尽管这在新兴电力电子应用中是可取的。提出和分析了典型的装置阻断高结温处的电特性。通过反向偏置电压的PN结给给出的阻塞电流电压特性的一部分可以装配到线性变化。在较高的施加朝向击穿区域的施加电压下,表现出与线性变化的偏差。通过将150℃的结温增加到200°C且高于该值,电流 - 电压特性的一部分变得更加减少。如果施加的电压达到电特性的一部分,则偏离线性变化朝向击穿区域,则在短时间内开发特性的热不稳定性。如果不抑制施加的电压,则可以使用设备故障。在这种条件下操作的故障设备的分析表示反向施加电压的PN连接电流过多或电气短路。结果表明,这种行为是由于位于结周边的物质劣化的光斑。大多数漏电流在半导体材料和从结边缘之间的钝化电介质材料之间流动,在高温下操作期间的许多器件故障。

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