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Strain Engineering of Single-Layer MoS2

机译:单层MOS2的应变工程

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In this work the effect of biaxial and uniaxial strain on the mobility of single-layer MoS2 at room temperatures is comprehensively studied. Scattering from intrinsic phonon modes, remote phonon and charged impurities are considered along with static screening. Ab-initio simulations are utilized to investigate the strain induced effects on the electronic bandstructure and the linearized Boltzmann transport equation is used to evaluate the low-field mobility under various strain conditions. The results indicate that the mobility increases with tensile biaxial and tensile uniaxial strain along the armchair direction. Under compressive strain, however, the mobility exhibits a nonmonotonic behavior when the strain magnitude is varied. In particular, with a relatively small compressive strain of 1% the mobility is reduced by about a factor of two compared to the unstrained condition, but with a larger compressive strain the mobility partly recovers such a degradation.
机译:在这项工作中,综合研究了双轴和单轴应变对室温下单层MOS2迁移率的影响。从内在声子模式,远程声子和带电杂质的散射都被视为静态筛选。 AB-Initio模拟用于研究对电子带结构的应变诱导效果,并且线性化的Boltzmann传输方程用于评估各种应变条件下的低场迁移率。结果表明,迁移率沿着扶手椅的拉伸双轴和拉伸单轴应变增加。然而,在压缩菌株下,迁移率在变化应变幅度时表现出非单调的行为。特别地,与未训练的条件相比,迁移率为1%的相对较小的压缩菌株减小了两倍,但是通过更大的压缩菌株,迁移率部分地恢复这种降解。

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