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Temperature-dependent leakage mechanisms of BiFeO3 films

机译:BifeO3薄膜的温度依赖性泄漏机制

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Epitaxial c-axis oriented BiFeO3 (BFO) thin films were deposited on conductive SrRuO3 (SRO) on (001) SrTiO3 substrates by pulsed laser deposition. A Pt/BFO/SRO capacitor was constructed by depositing a top Pt electrode. The leakage current density vs. electric field characteristics were investigated from 80 to 350 K. It was found that the leakage mechanisms were a strong function of temperature and voltage polarity. At temperatures between 80 and 150 K, space-charge-limited current was the dominant leakage mechanism for both negative and positive bias. On the other hand, at temperatures between 200 and 350 K the dominant leakage mechanisms were Poole-Frenkle emission and Fowler-Nordheim tunneling for negative and positive bias, respectively.
机译:通过脉冲激光沉积在(001)SRTIO3基板上沉积在(001)SrTiO3基板上的导电Srruo3(SrO)上的外延C轴取向BifeO3(BFO)薄膜。通过沉积顶部PT电极构建PT / BFO / SRO电容器。泄漏电流密度与电场特性从80〜350 K进行了研究。发现泄漏机构是温度和电压极性的强功能。在80和150 k之间的温度下,空间电荷限制是负偏向的主要泄漏机制。另一方面,在200到350 k之间的温度下,显着的泄漏机制分别为普罗 - 弗雷克隆排放和福勒 - 诺德海姆隧穿,分别用于负性和正偏压。

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