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The dielectric properties of Ba_(0.6)Sr_(0.4)Cr_(x)Ti_(1-x)O_(3) thin films prepared by pulsed laser deposition

机译:通过脉冲激光沉积制备的Ba_(0.6)Sr_(0.4)Cr_(x)Ti_(1-x)O_(3)薄膜的介电性能

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Ba_(0.6)Sr_(0.4)Cr_(x)Ti_(1-x)O_(3) (BSCT) films were prepared by pulsed laser deposition with the value of x varying from 0 mol(percent) to 2.0mol(percent). X-ray diffraction measurement detected an increasing in lattice parameters which could be due to the characteristic of film growth process. Dielectric properties of the BSCT films were measured. The dissipation factors were decreased in the Cr-doped films. The highest Figure of Merit (FOM) value of 33.3 was obtained in 1.0mol(percent)-doped BSCT film. As a result, the effect of Cr doping is positive.
机译:通过脉冲激光沉积制备Ba_(0.6)Sr_(0.4)CR_(X)Ti_(X)Ti_(3)(BSCT)膜,其值从0mol(百分比)到2.0mol(百分比) 。 X射线衍射测量检测到晶格参数的增加,这可能是由于薄膜生长过程的特性。测量了BSCT膜的介电性质。在Cr掺杂的薄膜中减少了耗散因子。在1.0mol(百分比) - 掺杂的BSCT膜中获得了33.3的最高值(FOM)值。结果,Cr掺杂的效果是阳性的。

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