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Metastable VO_2 complexes in silicon: experimental and theoretical modeling studies

机译:硅中的亚稳态VO_2复合物:实验和理论建模研究

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We report on a combined experimental and theoretical study of the metastable form of the vacancy-dioxygen defect in Si labeled VO_2~*. Important new experimental observations are the detection of mixed local vibrational modes of VO_2~* in ~(16)O, ~(18)O co-doped samples, the determination of the position of LVM bands for the negatively charged defect, and an assignment of an acceptor level at about E_c - 0.05 eV. Defect energetics, electrical levels and LVM frequencies of the VO_2~* complex are also investigated by ab-initio density-functional modeling. We find it to be a bistable defect which accounts well for the experimental data. The metastable form produces an acceptor state at ~0.05 eV below E_c, and can be thought of as a VO defect perturbed by interstitial oxygen.
机译:我们报告了Si标记的VO_2〜*中空位 - 二恶英缺损的亚稳态形式的组合实验和理论研究。重要的新实验观察是检测〜(16)o,〜(18)o o,〜(18)o o掺杂的样品的混合局部振动模式,确定LVM带的位置带负电缺损的位置,以及分配关于e_c - 0.05eV的受体水平。 AB-Initio密度功能建模还研究了VO_2〜*复合体的缺陷能量,电水平和LVM频率。我们发现它是一个对实验数据很好的双稳态缺陷。亚稳态形式在E_C下方〜0.05eV产生受体状态,并且可以被认为是由间质氧气扰乱的VO缺陷。

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