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Experimental and theoretical investigations of the metastable dissociations of organosilicon ions.

机译:有机硅离子的亚稳解离的实验和理论研究。

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摘要

The slow unimolecular reactions of organosilicon ions have been investigated with MIKES spectroscopy, electronic structure calculations, and phase space theory. The lowest energy dissociation pathways of silylenium ions have been found to involve eliminations of a stable neutral molecule. Many of these dissociations involve group migrations to the silylenium ion center resulting in the formation of carbenium ions. These carbenium ions are higher in energy than the silylenium ion isomers and in some cases have been found to be transition states on the potential energy surface. A prominent dissociation pathway for a number of silylenium ions is loss of ethylene. Ions containing ethyl groups, H(R1)Si(C2H5)+, with R 1 = H, Cl, CH3 and C2H5 along with Si(CH3)(C2H5)2+ lose ethylene from the ethyl moiety. The mechanism for these dissociations is either a beta-hydrogen migration pathway or sequential 1,2-hydrogen migrations. The dimethyl substituted ions, R2Si(CH3)2 +, R2 = H, Cl and CH3 also undergo ethylene loss. The loss of ethylene can occur from the two methyl groups by either of two mechanisms. The first involves simultaneous transfer of hydrogens from the methyl groups to the silicon center, forming the ion-molecule complex, R2SiH2+ &cdots; C2H4. The second involves the formation of the alpha-silylcarbenium ions, (R2)HSi(CH3)(CH2+), which are transition states on the potential energy surface connecting the R2Si(CH3)2+ and H(R 2)Si(C2H5)+ ions. The experimental results indicate that the SiC2H7+ isomers, HSi(CH3)2+ and H2Si(C 2H5)+, interconvert prior to dissociation while the SiC3H9+ isomers, Si(CH 3)3+ and HSi(CH3)(C2H 5)+, and the SiC2H6Cl+ isomers, ClSi(CH3)2+ and H(Cl)Si(C 2H5)+ do not. Silylenium ions containing a single methyl group, H(R4)Si(CH3)2 + (R4 = H and Cl) undergo elimination of HR 4. The KERDs for these dissociations are bimodal, indicating that two different processes are occurring. The narrow component of the KERD is due to 1,2-eliminations and the large component is due to 1,1-eliminations. Five trimethylsubstituted ions have been studied, (CH3)3Si-Si(CH 3)2+ and (CH3)3Si-X-Si(CH 3)2+ (X = O, CH2, NH and C≡C). All ions studied exhibit loss of CH4, which has not been observed for any of the monosilicon containing ions. The mechanism for this dissociation is believed to occur across silicon centers and to result in the formation of disilacyclobutyl ions.
机译:用MIKES光谱,电子结构计算和相空间理论研究了有机硅离子的缓慢单分子反应。已经发现硅离子的最低能量解离途径涉及消除稳定的中性分子。这些离解中的许多涉及基团迁移至硅离子中心,导致形成碳正离子。这些碳正离子的能量高于甲硅烷基离子异构体,并且在某些情况下已发现其为势能表面上的过渡态。许多甲硅烷基离子的主要离解途径是乙烯的损失。含有乙基的离子H(R1)Si(C2H5)+,其中R 1 = H,Cl,CH3和C2H5以及Si(CH3)(C2H5)2+会从乙基部分失去乙烯。这些解离的机制是β-氢迁移途径或顺序的1,2-氢迁移。二甲基取代的离子R2Si(CH3)2 +,R2 = H,Cl和CH3也会发生乙烯损失。乙烯的损失可以通过两种机理之一从两个甲基发生。第一种方法是将氢同时从甲基转移到硅中心,形成离子-分子配合物R2SiH2 +。 C2H4。第二个过程涉及形成(R2)HSi(CH3)(CH2 +)的α-甲硅烷基碳离子,这是在连接R2Si(CH3)2+和H(R 2)Si(C2H5)的势能面上的过渡态+离子。实验结果表明,SiC2H7 +异构体HSi(CH3)2+和H2Si(C 2H5)+在解离前会相互转化,而SiC3H9 +异构体Si(CH 3)3+和HSi(CH3)(C2H 5)+而SiC2H6Cl +异构体ClSi(CH3)2+和H(Cl)Si(C 2H5)+没有。含有单个甲基H(R4)Si(CH3)2 +(R4 = H和Cl)的硅离子经历HR 4消除。这些离解的KERD是双峰的,表明正在发生两个不同的过程。 KERD的狭窄部分归因于1,2-消除,而较大的原因归因于1,1-消除。已经研究了五个三甲基取代的离子(CH3)3Si-Si(CH 3)2+和(CH3)3Si-X-Si(CH 3)2+(X = O,CH2,NH和C andC)。研究的所有离子均表现出CH4的损失,这对于任何含单晶硅的离子均未观察到。据信这种解离的机理发生在硅中心,并导致二硅环环丁基离子的形成。

著录项

  • 作者

    Willard, Belinda Belle.;

  • 作者单位

    Carnegie Mellon University.;

  • 授予单位 Carnegie Mellon University.;
  • 学科 Physical chemistry.;Inorganic chemistry.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 224 p.
  • 总页数 224
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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