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MEASUREMENT OF COPPER IN P-TYPE SILICON USING CHARGE-CARRIER LIFETIME METHODS

机译:使用电荷载体寿命方法测量p型硅中的铜

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摘要

We compare SPV technique with μ-PCD for the determination of recombination activity of copper precipitates in p-Si. The copper precipitates were formed in bulk silicon through illumination at room temperature. We observed that the recombination activities of copper precipitates measured with SPV are higher than the ones measured with μ-PCD technique. However, it seems that the copper detection sensitivity is about the same with SPV and μ-PCD techniques.
机译:我们将SPV技术与μ-PCD进行比较,以确定P-Si中铜沉淀物的重组活性。通过室温的照明在大量硅中形成铜沉淀物。我们观察到,用SPV测量的铜沉淀物的重组活性高于用μ-PCD技术测量的铜沉淀物。然而,似乎铜检测灵敏度与SPV和μ-PCD技术大致相同。

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