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Charged Silicon Nitride Films: Field-Effect Passivation of Silicon Solar Cells and a Novel Characterization Method through Lifetime Measurements.

机译:带电氮化硅膜:硅太阳能电池的场效应钝化和通过寿命测量的新型表征方法。

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摘要

Silicon (Si) solar cells are the dominant technology used in the Photovoltaics industry. Field-effect passivation by means of electrostatic charges stored in an overlying insulator on a silicon solar cell has been proven to be a significantly efficient way to reduce effective surface recombination velocity and increase minority carrier lifetime. Silicon nitride (SiNx) films have been extensively used as passivation layers. The capability to store charges makes SiNx a promising material for excellent feild effect passivation.;In this work, symmetrical Si/SiO2/SiNx stacks are developed to study the effect of charges in SiNx films. SiO 2 films work as barrier layers. Corona charging technique showed the ability to inject charges into the SiNx films in a short time. Minority carrier lifetimes of the Czochralski (CZ) Si wafers increased significantly after either positive or negative charging.;A fast and contactless method to characterize the charged overlying insulators on Si wafer through lifetime measurements is proposed and studied in this work, to overcome the drawbacks of capacitance-voltage (CV) measurements such as time consuming, induction of contanmination and hysteresis effect, etc. Analytical simulations showed behaviors of inverse lifetime (Auger corrected) vs. minority carrier density curves depend on insulator charge densities (N f). From the curve behavior, the Si surface condition and region of Nf can be estimated.;When the silicon surface is at high strong inversion or high accumulation, insulator charge density (Nf) or surface recombination velocity parameters (Sn0 and Sp0) can be determined from the slope of inverse lifetime curves, if the other variable is known. If S n0 and Sp0 are unknown, Nf values of different samples can be compared as long as all have similar Sn0 and Sp0 values. Using the saturation current density (J 0) and intercept fit extracted from the lifetime measurement, the bulk lifetime can be calculated. Therefore, this method is feasible and promising for charged insulator characterization.
机译:硅(Si)太阳能电池是光伏行业中使用的主要技术。事实证明,借助于存储在硅太阳能电池上覆绝缘子中的静电荷进行的场效应钝化是降低有效表面复合速度并增加少数载流子寿命的有效途径。氮化硅(SiNx)膜已被广泛用作钝化层。存储电荷的能力使SiNx成为具有出色的菲尔德效应钝化的有前途的材料。在这项工作中,开发了对称的Si / SiO2 / SiNx叠层以研究SiNx膜中电荷的影响。 SiO 2膜用作阻挡层。电晕充电技术显示了在短时间内将电荷注入SiNx膜的能力。在正电荷或负电荷后,Czochralski(CZ)Si晶片的少数载流子寿命会显着增加。;通过这项寿命测量方法,提出并研究了一种快速且无接触的方法来表征Si晶片上带电的绝缘体,以克服上述缺点分析模拟表明,寿命的倒数(经俄歇校正)与绝缘体电荷密度(N f)有关的少数载流子密度曲线相反(经Auger校正)。根据曲线行为,可以估算出硅的表面状态和Nf的区域。当硅表面处于高强反转或高累积状态时,可以确定绝缘体电荷密度(Nf)或表面复合速度参数(Sn0和Sp0)如果已知其他变量,则从寿命逆曲线的斜率开始计算。如果S n0和Sp0未知,则可以比较不同样本的Nf值,只要它们的Sn0和Sp0值都相似即可。使用从寿命测量中提取的饱和电流密度(J 0)和截距拟合,可以计算出整体寿命。因此,该方法是可行的,并有望用于带电绝缘子的表征。

著录项

  • 作者

    Yang, Qun.;

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 M.S.
  • 年度 2014
  • 页码 78 p.
  • 总页数 78
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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