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Defects Suppression of Ni-P thin Film on Polymer Substrate via catalyzation in Sc-CO_2 and Electroless Plating in Sc-CO_2 emulsion

机译:通过SC-CO_2催化催化在SC-CO_2乳液中催化缺陷聚合物基材上Ni-P薄膜的抑制

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The flexible and biocompatible properties of polymer make polymer MEMS promising candidates for the next generation of micro devices. Bio-medical micro devices such as intracortical electrode on polymer substrate for neural interface are envisioned[1-2]. Polyimide has many outstanding properties, including good thermal stability, low dielectric constants, low dissipation factors, and inherent surface inertness. In addition, the polyimide surface chemistry is amenable to modifications and preparations which allow a host of bioactive organic species to be either adsorbed or covalently bonded to its surface[3]. These properties are important for application in MEMS technology. The best way to improve the quality of the metallization on polymer will be to develop a novel micro-fabrication technique for plating metal onto polymer substrate. Electroless plating were widely used for making thin film on organic substrate. Yet polymer substrates are hydrophobic and respond poorly to the wetness of the electroplating solution. One way to achieve contact Pd catalyzation on polymer substrate under this condition is to change from a hydrophobic to a hydrophilic surface. Chromate treatment has been used for this purpose in conventional catalyzation, but the environmental affinity restricts the applicability[4]. To alleviate this problem, we proposed a novel technique which is carried out in Sc-CO_2 with organic Pd complex in catalyzation procedure and an electroless plating reaction are conducted in emulsion of Sc-CO_2 and electroless plating solution with surfactant[5]. In previous experiment, we obtained an Ni-P thin film with fewer pinholes and voids by catalyzing the polyimide using supercritical CO_2 and an electroless plating mixing emulsion. Moreover, we discussed Sc-CO_2 effect on nucleation and nuclei growth of catalyst for uniform and smooth metallization on polymer through quantitative microscopic method on the microscopic images of the catalyzed substrates and the plated films with comparison with conventional catalyzation[6-7]. However, the problems to solve which individual properties of Sc-CO_2 play a dominant role to suppress the defects are remained. If we are to use this method, we must clarify effects of Sc-CO_2 for suppression of voids on electroless plated thin metal film and improvement of interface stability between fabricated metal and polymer substrate. In this report, we discuss how transport properties of Sc-CO_2 and the affinity with substrate affect the suppression of the defects in Ni-P thin film on polyimide substrate.
机译:聚合物的柔性和生物相容性性能使聚合物MEMS用于下一代微型器件的候选物。设想生物医学微型器件,例如神经界面上的聚合物基材上的肠球电极[1-2]。聚酰亚胺具有许多优异的性质,包括良好的热稳定性,低介电常数,低耗散因子和固有的表面惰性。此外,聚酰亚胺表面化学可用于修饰和制剂,其允许使许多生物活性有机物质具有吸附或共价键合到其表面[3]。这些属性对于在MEMS技术中的应用很重要。提高聚合物金属化质量的最佳方法是开发一种用于将金属电镀到聚合物基材上的新型微制造技术。化学镀被广泛用于在有机基质上制造薄膜。然而,聚合物底物是疏水性的并且对电镀溶液的湿度响应不良。在该条件下在聚合物基板上实现接触Pd催化的一种方法是从疏水性转化为亲水表面。铬酸盐处理已在常规催化中用于此目的,但环境亲和力限制了适用性[4]。为了缓解这个问题,我们提出了一种新的技术,其在SC-CO_2中进行催化Pd络合物,在催化过程中,通过表面活性剂的SC-CO_2和无电镀液进行化学镀反应[5]。在先前的实验中,通过使用超临界CO_2和化学镀混合物乳液催化聚酰亚胺,获得具有较少针孔和空隙的Ni-P薄膜。此外,我们讨论了SC-CO_2对催化剂催化剂催化剂的核细胞和核生长,通过定量微观方法通过催化的基底的微观图像和与常规催化进行比较[6-7]。然而,解决SC-Co_2的各个属性的问题仍然存在抑制缺陷的主题作用。如果我们要使用这种方法,我们必须阐明SC-CO_2的效果以抑制无电镀薄金属膜上的空隙,以及改善制造金属和聚合物基材之间的界面稳定性。在本报告中,我们讨论了SC-CO_2的运输特性以及与衬底的亲和力如何影响聚酰亚胺衬底上Ni-P薄膜的缺陷。

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