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ELECTROLESS Ni-P PLATING SOLUTION AND ELECTROLESS Ni-P PLATING METHOD

机译:化学镀Ni-P溶液和化学镀Ni-P方法

摘要

PROBLEM TO BE SOLVED: To provide an electroless Ni-P plating solution and method, capable of easily managing a solution, stabilizing the composition of a plating film and forming a Ni-P alloy plating film excellent in corrosion resistance with fast deposition rate and good workability.;SOLUTION: The electroless Ni-P plating solution comprises: water-soluble nickel sa hypophosphorous acid or its sa at least one kind of complexing agents selected from a group consisting of dicarboxylic acid, oxycarbonic acid and aminocarboxylic acid; quarternary ammonium sa and ions of at least one kind of metals selected from a group consisting of Mo, Sb, Mn and Ti or oxide ions of the metal.;COPYRIGHT: (C)2015,JPO&INPIT
机译:解决的问题:提供能够容易地管理溶液,稳定镀膜的组成并形成耐蚀性优异,沉积速度快且良好的Ni-P合金镀膜的化学镀Ni-P镀液和方法。解决方案:化学镀Ni-P溶液包括:水溶性镍盐;次磷酸或其盐;选自由二羧酸,氧碳酸和氨基羧酸组成的组中的至少一种络合剂;季铵盐;选自Mo,Sb,Mn和Ti的至少一种金属的离子或该金属的氧化物离子。; COPYRIGHT:(C)2015,JPO&INPIT

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