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Giant positive magnetoresistance in ultrathin films of mixed phase manganites

机译:混合相锰超薄薄膜中的巨磁阻

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Magnetic tunnel junctions (MTJs) based on fully spin polarized ferromagnetic manganites have generated a lot of interest due to their enhanced field sensitivity at low temperatures. However, the tunneling magnetoresistance (TMR) drops rapidly with increasing temperature due to the reduction of spin polarization at the manganite-insulator interface. We have devised a method for creating intrinsic tunnel barriers by tuning the phase competition in manganites using substrate induced strain. Ultrathin films (7.5 nm) of the mixed phase manganite (La_(0.5)Pr_(0.5))_(0.67)Ca_(0.33)MnO_3 (LPCMO) grown on the substrate (110) NdGaO_3 using pulsed laser deposition show positive magnetoresistance (MR) of about 30 percent at magnetic fields less than 1 T. Unlike the fabricated MTJ devices, this MR effect has its maximum value close to the insulator to metal transition temperature and reduces with decreasing temperature. To find out the mechanism leading to this positive MR, the effect of three orientations of the magnetic field on the LPCMO thin films were studied: (1) perpendicular to the plane of the film, (2) parallel to the plane of the film and applied current, and (3) parallel to the plane of the film but perpendicular to the applied current. The effect of field orientation suggests that a possible mechanism for the positive MR is tunneling magnetoresistance due to the spin conserving tunneling process across the insulating regions separating the ferromagnetic metallic regions. The voltage dependence of the MR also supports this mechanism. Our results suggest a novel method for obtaining enhanced TMR in manganite based MTJs by creating strain induced intrinsic tunnel barriers.
机译:基于完全自旋极化铁磁性锰酸盐的磁隧道结(MTJS)由于其在低温下的田间敏感性增强而产生了很多兴趣。然而,由于锰岩绝缘体界面处的旋转偏振的降低,隧道磁阻(TMR)随着较高的温度而迅速下降。我们设计了一种通过使用基材诱导的应变调节锰脂苷中的相位竞争来创造内在隧道障碍的方法。使用脉冲激光沉积在衬底(110)NdgaO_3上生长的混合相锰锰(La_(0.5)PR_(0.5))_(0.67)CA_(0.33)MnO_3(LPCMO)的超薄膜(0.67)CA_(0.33)MNO_3(LPCMO)显示阳性磁阻(MR在磁场下的约30%小于1T的磁场。与制造的MTJ器件不同,该MR效应与金属转变温度接近绝缘体的最大值并随温度降低而减少。为了找出导致该正MR的机制,研究了LPCMO薄膜上的磁场的三个取向的影响:(1)垂直于膜的平面,(2)平行于薄膜的平面和施加电流,(3)平行于膜的平面,但垂直于施加的电流。现场取向的效果表明,由于旋转隧穿过程,其跨越铁磁金属区域的绝缘区域的旋转节约隧穿过程,正MR的可能机构是隧道磁阻。 MR的电压依赖性也支持这种机制。我们的研究结果表明,通过产生应变诱导的内在隧道屏障来提高基于MTJ的增强TMR的新方法。

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