首页> 外文会议>European Microelectronics and Packaging Conference Exhibition >Investigation of the influence of UBM on Lead Free Flip Chip Solder Fatigue Life by Explicit Finite Element Modeling of Intermetallic Layers
【24h】

Investigation of the influence of UBM on Lead Free Flip Chip Solder Fatigue Life by Explicit Finite Element Modeling of Intermetallic Layers

机译:金属间层明确有限元建模ubm对无铅倒装芯片焊接寿命的影响

获取原文

摘要

Lead free flip chip bumping for fine pitch applications necessitates the use of electroplated bumps. But the very nature of electroplating process makes it difficult to use the more common Sn/Ag or Sn/Ag/Cu lead free alloys. Electroplated pure tin bumping is relatively easy process and has provided with comparable results to eutectic Sn/Pb for thermal cycling reliability. However tin is extremely reactive and hence the choice of Under Bump Metallization (UBM) is very critical. Experimentally, it has been reported that a significantly higher (~40%) thermal cycle life is seen with the use of Cobalt UBM instead of Copper UBM for a flip chip device assembled on an alumina substrate. Under the current approaches used to estimate fatigue life of solder joints, the solder joint is treated as a homogenous material and modeled as such. However the smaller joint sizes and higher reactivity of Sn means that larger amount of intermetallics are formed as a percentage of bump volume. The existing approach cannot account for the influence on the fatigue behaviour of these intermetallic layers within the solder joint. In order to investigate if a simplified engineering approach can provide some insight into this issue, we have attempted to explicitly model the intermetallics as a continuous but separate part of the solder joint. The main damage parameter investigated is the accumulated inelastic strain in a single thermal cycle. The influence of the intermetallics properties on the stress and strain distributions and also on the accumulated inelastic strain have been explored and a reasonable correlation between the experimental and FEA results has been obtained. Both the experimental and FE results suggest that changing the UBM from copper to cobalt can improve the fatigue life by 20- 40%.
机译:用于细间距应用的无铅倒装芯片凸块需要使用电镀凸块。但电镀过程的本质使得难以使用更常见的Sn / Ag或Sn / Ag / Cu铅免合金。电镀纯锡凸突相对易于易于易于易于提供对热循环可靠性的共晶Sn / Pb的可比结果。然而,锡是极其反应性,因此在凸块金属化(UBM)下的选择非常关键。通过实验,据报道,利用钴UBM而不是在组装在氧化铝基材上组装的倒装芯片装置的铜UBM,可以看到显着更高(〜40%)热循环寿命。在用于估计焊点疲劳寿命的电流方法下,焊点被视为均匀材料并因此进行建模。然而,Sn的较小的关节尺寸和更高的反应性意味着更大量的金属间金属间形成为凸块体积的百分比。现有方法不能考虑对焊点内这些金属间层的疲劳行为的影响。为了调查简化的工程方法可以对此问题提供一些洞察力,我们试图将金属间金属的模拟作为焊点的连续而单独的部分。研究的主要损伤参数是单个热循环中的累积绝缘应变。已经探讨了金属间特性对应力和应变分布的影响,并且已经获得了实验和FEA结果之间的合理相关性。实验和Fe结果都表明将UBM从铜改变为钴可以将疲劳寿命提高20-40%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号