Ar sputter shadow method (ASSM) - a novel way to overcome the charging effect during AES bond pad analysis

摘要

This paper discusses a novel technique using locally restricted Ar sputter for sample preparation, called ASSM, to overcome charging during AES analysis of polyimide surrounded bond pads. Subsequently, using Ar ion flooding, charging can be effortlessly reduced. Comparison of four anti-charging methods shows that ASSM has the advantage of obtaining reliable data easier than the others. It is suggested that ASSM generates conductive paths in the vicinity of the analysis area. XPS investigations indicate a reduced density of imide groups in the adjacent sputtered regions.