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Application of Ultra-Thin Silicon Technology to Submillimeter Detection and Mixing

机译:超薄硅技术在淹没检测和混合中的应用

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Superconducting based SIS and HEB detectors continue to yield improved noise temperatures at submillimeter wavelengths. These higher frequencies present new challenges, particularly for waveguide based designs where the tolerances for mounting small mixer chips become quite narrow. Also, conventional millimeter wavelength techniques for making the IF and ground connections are more prone to error. As the device technology for these SIS and HEB-based detectors matures, there is also an increased interest in integrated receiver arrays. These challenges call for simpler mounting designs and more repeatable assembly techniques. Our research group, at the University of Virginia, is meeting these challenges with a new ultra-thin mixer chip technology, with integrated gold beam leads, first reported in [1]. We have since further developed and improved on this technology. We have several ongoing SIS, HEB and OMT projects which utilize these capabilities. Most important to this technology is the transition from the conventional use of quartz as a circuit substrate material to that of ultra-thin (<10 microns) silicon. We accomplish this by creating the mixer circuitry on a silicon-on-insulator (SOI) wafer and using a sophisticated backside release process to produce individual mixer chips. These 3 micron ultra-thin chips present less dielectric material within a waveguide channel and are actually much more robust than quartz chips that are an order of magnitude, or more, thicker. We use integrated 1-2 micron thick gold beam leads to simplify the electrical connection and placement of the chip within the receiver waveguide. Beam leads are another component of the mounting process that makes our modular mixer implementation possible. Based on our SOI process, we are currently developing several HEB mixers- two single element metal waveguide designs at 600 GHz and 1.6 THz, and an integrated array approach using silicon laser micromachined blocks centered at 900 GHz and 1.8 THz. We are also pursuing several SIS mixers-one single element 350-500 GHz design with ultra wide IF bandwidth and one 350 GHz receiver array. In this paper we will discuss our ultra thin silicon beam lead technology and the ongoing progress of these new receivers.
机译:基于超导的SIS和HEB探测器继续在亚倍数钟波长下产生改善的噪声温度。这些较高的频率存在新的挑战,特别是对于基于波导的设计,其中用于安装小型搅拌器芯片的公差变得非常窄。而且,用于制造IF和接地连接的常规毫米波长技术更容易出错。作为这些SIS和基于HEB的探测器的设备技术,在集成接收器阵列中也存在增加的兴趣。这些挑战要求更简单的安装设计和更可重复的装配技术。我们的研究小组在弗吉尼亚大学,通过新的超薄搅拌机芯片技术符合这些挑战,其中包含集成的金束引线,首先报道了[1]。我们已经进一步开发和改进了这项技术。我们有几个正在进行的SIS,HEB和OMT项目,利用这些功能。对于该技术最重要的是从常规使用石英作为电路基板材料的过渡到超薄(<10微米)硅的电路基板材料。我们通过在绝缘体上的硅(SOI)晶片上创建混频器电路并使用复杂的背面释放过程来实现这一点,以产生各个混频器芯片。这3微米超薄芯片在波导通道内呈现较少的介电材料,实际上比石英屑更强大,这是一个数量级,或更多,较厚的尺寸。我们使用集成的1-2微米厚金束,以简化接收器波导内芯片的电连接和放置。光束引线是安装过程的另一个组件,使我们的模块化混频器实现成为可能。根据我们的SOI流程,我们目前正在开发几个HEB混合器 - 两个单一元素金属波导设计,在600 GHz和1.6THz上设计,以及使用以900GHz和1.8 THz为中心的硅激光微机器块的集成阵列方法。我们还在追求多个SIS混合器 - 一个单一元素350-500 GHz设计,具有超宽IF带宽和一个350 GHz接收器阵列。在本文中,我们将讨论我们的超薄硅束铅技术和这些新接收器的持续进展。

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