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4H-SiC Schottky Array Photodiodes for UV Imaging Application Based on the Pinch-off Surface Effect

机译:4H-SIC肖特基阵列光电二极管,用于紫外线成像应用,基于夹紧表面效应

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The fabrication of high sensitive diodes array is very attractive for spectroscopic and astronomical UV imaging applications, particularly when visible light rejection is required. Wide band gap materials are excellent candidates for UV "visible blind" detection. In this paper, we demonstrate an array of Schottky UV-diodes on 4H-SiC with a single pixel area of about 1.44 mm{sup}2 and a total area of about 29 mm{sup}2. The Schottky photodiodes are based on the pinch-off surface effect, the front electrode being an interdigit Ni{sub}2Si contact that allows the direct light exposure of the optically active device area. For the proposed array, the optically active area is about the 48% of total area. The single pixel dark current was below 0.1 nA up to -50 V and a fabrication yield of about 90% was observed. The external quantum efficiency of the proposed array exhibits a peak of 45% at the 289 nm wavelength and a visible rejection ratio > 4 ×10{sup}3.
机译:高敏感二极管阵列的制造对于光谱和天文UV成像应用非常有吸引力,特别是当需要可见光抑制时。宽带隙材料是用于UV“可见盲”检测的优异候选者。在本文中,我们在4H-SiC上展示了一个肖特基UV-二极管的阵列,单个像素区域约为1.44mm {sup} 2,总面积约为29mm {sup} 2。肖特基光电二极管基于夹紧表面效果,前电极是Interdigit Ni {Sub} 2SI接触,其允许光学主动装置区域的直接曝光。对于所提出的阵列,光学活性面积约占总面积的48%。单像素暗电流低于0.1Ana,高达-50V,观察到约90%的制造产率。所提出的阵列的外部量子效率在289nm波长和可见抑制比> 4×10 {sup} 3处显示出45%的峰值。

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