首页> 外文会议>European Conference on Silicon Carbide and Related Materials >Initial Stages of the Graphite-SiC(0001) Interface Formation Studied by Photoelectron Spectroscopy
【24h】

Initial Stages of the Graphite-SiC(0001) Interface Formation Studied by Photoelectron Spectroscopy

机译:通过光电子光谱研究的石墨SIC(0001)界面形成的初始阶段

获取原文

摘要

Graphitization of the 6H-SiC(0001) surface as a function of annealing temperature has been studied by ARPES, high resolution XPS, and LEED. For the initial stage of graphitization -the 6 3~(1/2) reconstructed surface - we observe σ-bands characteristic of graphitic sp~2-bonded carbon. The π-bands are modified by the interaction with the substrate. C1s core level spectra indicate that this layer consists of two inequivalent types of carbon atoms. The next layer of graphite (graphene) formed on top of the 6 3~(1/2) surface at T_A=1250°C-1300°C has an unperturbed electronic structure. Annealing at higher temperatures results in the formation of a multilayer graphite film. It is shown that the atomic arrangement of the interface between graphite and the SiC(0001) surface is practically identical to that of the 6 3~(1/2) reconstructed layer.
机译:通过ARPE,高分辨率XPS和LEED研究了作为退火温度的函数的6H-SiC(0001)表面的石墨化。对于石墨化的初始阶段 - 6 3〜(1/2)重建表面 - 我们观察石墨SP〜2键合碳的σ带特性。通过与基板的相互作用来修改π带。 C1S核心水平光谱表明该层由两种不等数类型的碳原子组成。在T_A = 1250°C-1300℃的6 3〜(1/2)表面顶部形成的下一层图石墨(图石墨烯)具有不受干扰的电子结构。在较高温度下退火导致多层石墨膜的形成。结果表明,石墨和SiC(0001)表面之间的界面的原子布置实际上与6 3〜(1/2)重建层的接口。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号