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Interface electronic properties of co-evaporated MAPbI_3 on ZnO(0001): In situ X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy study

机译:共蒸发的MAPbI_3在ZnO(0001)上的界面电子性质:原位X射线光电子能谱和紫外光电子能谱研究

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摘要

In this work, the interface electronic properties of ZnO(0001)/CH_3NH_3PbI_3 were investigated by both X-ray and ultraviolet photoelectron spectroscopy. The CH_3NH_3PbI_3 thin films were grown on single crystalline ZnO(0001) substrate in situ by co-evaporation of PbI_2 and CH_3NH_3I at room temperature with various thickness from 1.5 nm to 190 nm. It was found that the conduction band minimum of ZnO lies 0.3 eV below that of CH_3NH_3PbI_3, while the valence band maximum of ZnO lies 2.1 eV below that of CH_3NH_3PbI_3, implying that the electrons can be effectively transported from CH_3NH_3PbI_3 to ZnO, and the holes can be blocked in the same time. A PbI_2 rich layer was initially formed at the interface of ZnO(0001)/CH_3NH_3PbI_3 during the growth. As a consequence, an interface barrier was built up which may prevent the electron transport at the interface.
机译:在这项工作中,ZnO(0001)/ CH_3NH_3PbI_3的界面电子性质通过X射线和紫外光电子能谱研究。通过在室温下以1.5nm至190nm的各种厚度共蒸发PbI_2和CH_3NH_3I,将CH_3NH_3PbI_3薄膜原位生长在单晶ZnO(0001)衬底上。发现ZnO的导带最小值比CH_3NH_3PbI_3低0.3 eV,而ZnO的价带最大值比CH_3NH_3PbI_3低2.1 eV,这意味着电子可以有效地从CH_3NH_3PbI_3传输到ZnO,并且空穴可以同时被封锁。生长期间,最初在ZnO(0001)/ CH_3NH_3PbI_3的界面上形成了一个富PbI_2层。结果,建立了界面阻挡层,其可以防止电子在界面处传输。

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  • 来源
    《Applied Physics Letters》 |2016年第12期|121601.1-121601.4|共4页
  • 作者单位

    School of Physics and Engineering and State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, 510275 Guangzhou, China;

    School of Physics and Engineering and State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, 510275 Guangzhou, China;

    Key Laboratory of Optoelectronic Materials Chemistry and Physics, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, 350002 Fuzhou, China,University of the Chinese Academy of Sciences, 100049 Beijing, China;

    School of Physics and Engineering and State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, 510275 Guangzhou, China;

    School of Physics and Engineering and State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, 510275 Guangzhou, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:38

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