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Excess Carrier Lifetimes in a Bulk p-type SiC Wafer Measured by the Microwave Photoconductivity Decay Method

机译:通过微波光电导衰减法测量的散装P型SiC晶片中的多余载体寿命

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Abstract We carried out mapping of the excess carrier lifetime for a bulk p-type 4H-SiC wafer by the microwave photoconductivity decay (μ-PCD) method, and we compared the lifetime map with structural defect distribution. Several small regions with short lifetimes compared with surrounding parts are found, and they correspond to regions with high-density structural defects. Excess carrier decay curves for this wafer show a slow component, which originates from minority carrier traps. From temperature dependence of the excess carrier decay curve, we found decrease of the time constant of the slow component with increasing temperature. We compared the activation energy of the time constant with that obtained from the numerical simulation, and concluded that the energy level for the minority carrier trap would be 125 meV from the conduction band.
机译:摘要我们通过微波光电电导光衰减(μ-PCD)方法对散装P型4H-SiC晶片进行多余载体寿命的映射,并将寿命图与结构缺陷分布进行了比较。找到与周围零件相比的几个短的小区域,它们对应于具有高密度结构缺陷的区域。这种晶片的多余载波衰减曲线显示出慢组件,其起源于少数载体陷阱。从过量载波衰减曲线的温度依赖性,我们发现缓慢部件随温度越来越多的时间常数降低。我们将时间常数与从数值模拟中获得的时间常数进行比较,并且得出结论,少数载波陷阱的能级将是导通带的125meV。

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