We have used the e-beam lithography to pattern micro- and nanostruc-tures on silicon substrate. The beam exposure was done by a modified scanning electron microscope, JEOL 6460, with NPGS lithographic system. A single layer and bi-layer techniques were used to prepare the samples. With the single-layer technique, we have fabricated 200nm-lines, rings and resistors. With the bi-layer technique, the substrate is coated with PMGI and PMMA resists to achieve a lift-off profile. With this technique, we have fabricated honeycomb structures and a prototype tunneling device. We have also demonstrated how to align large pads to connect small devices by adjusting the offset origin in different writing fields, without, moving the mechanical stage of microscope.
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