Growth of Nanocrystalline Pd Films on Si (111)

摘要

Nanocrystalline thin films of Pd metal has been deposited using inert gas condensation technique on (111) oriented Si substrates. The film morphology of Pd films grown under different argon gas pressures has been investigated using atomic force microscopy in contact mode. The results show that the film morphology depends strongly on argon pressure and the lowest grain size of ～20 nm is obtained at a pressure of 10~(-2) Ton. The films are found to grow with (111) orientation. X-ray photoelectron spectroscopic studies show that grown films are always metallic.