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Current-voltage-time characteristics in a reactive Ar/N_2 high power impulse magnetron sputtering discharge

机译:反应性AR / N_2高功率脉冲磁控溅射放电的电流 - 电压时特性

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The discharge current and voltage waveforms have been measured in a reactive high power impulse magnetron sputtering (HiPIMS) Ar/N_2 discharge for 400 μs long pulses to explore the effect of nitrogen addition and the pulse repetition frequency. Adding nitrogen to an argon discharge leads to increased discharge current as the pulse repetition frequency is decreased. We argue that the secondary electron emission coefficient and its variation with surface condition and ion composition in the discharge plays a crucial role in determining the discharge current.
机译:在400μs长脉冲中,在反应性高功率脉冲磁控管溅射(HIPIMS)AR / N_2放电中已经测量了放电电流和电压波形,以探索氮气添加和脉冲重复频率的效果。随着脉冲重复频率降低,将氮气添加到氩气排出的引线增加了放电电流。我们认为,在放电中具有表面状况和离子组合物的二次电子发射系数及其变化在确定放电电流时起着至关重要的作用。

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