Modelling and HRTEM computer simulation of facetting of SnO_2 nanostructures deposited by spray pyrolysis on glass substrates

摘要

SnO_2 thin films grown by spray pyrolysis on glass substrates have been studied. The evolution of the crystallographic orientation of these films (35-300nm) with the variation of the pyrolysis temperature (300°C - 530°C) is reported. Samples have been characterised by X-ray diffraction and high resolution transmission electron microscopy. Some atomic models of grain growth for each pyrolysis temperature have been proposed. These models have been tested by computer image simulation in order to compare with the experimental images.