Synthesis of NbN thin films by D.C. magnetron sputtering

摘要

Thin films of niobium nitride (NbN) were deposited on SKD11 tool steel substrate by a dc magnetron sputtering system. The influence of the N/sub 2//Ar gas ratio of the inlet gases, the deposition temperature, the substrate bias potential on the mechanical and structural properties of the films were investigated. The X-ray diffraction data showed NbN deposited at room temperature has cubic structures. Hexagonal phases were formed with the increase of the deposition temperature. The hardness of the films increased with the increase of the deposition temperature up to 300/spl deg/C. Adhesion of the films decreased with the increase of the deposition temperature. The hardness of film was maximum at the bias potential of -200 V and decreased with further increase of the bias potential. The films deposited at the substrate bias potential range of -50 V to -150 V exhibited relatively high adhesion.