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PHYSICAL CHARACTERIZATION OF THIN HfO_2 LAYERS BY THE COMBINED ANALYSIS WITH COMPLEMENTARY TECHNIQUES

机译:互补技术的组合分析薄HFO_2层的物理特征

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摘要

The physical properties of HfO_2 layers prepared by atomic layer and metal organic chemical vapor deposition are analyzed by a combination of different complementary analysis techniques. It is shown that by the combination of the information deduced from the different techniques for the thickness, and the chemical and structural characteristics of the layers, the data analysis methodologies for the different techniques can be optimized.
机译:通过不同的互补分析技术的组合分析由原子层和金属有机化学气相沉积制备的HFO_2层的物理性质。结果表明,通过从不同技术推导的信息的组合,以及层的化学和结构特征,可以优化不同技术的数据分析方法。

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