首页> 外文会议>International symposium on solid-state ionic devices >IMPEDANCE DIAGRAMS OF SEMICONDUCTOR/OXIDE/ELECTROLYTE (SOE) STRUCTURES TO DERIVE EQUIVALENT R-C COMPONENTS OF THE SEMICONDUCTOR SPACE CHARGE
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IMPEDANCE DIAGRAMS OF SEMICONDUCTOR/OXIDE/ELECTROLYTE (SOE) STRUCTURES TO DERIVE EQUIVALENT R-C COMPONENTS OF THE SEMICONDUCTOR SPACE CHARGE

机译:半导体/氧化物/电解质(SOE)结构的阻抗图,以导出半导体空间电荷的等效R-C组件

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The zero current impedance of a silicon substrate in a semi-conductor/oxide/electrolyte (SOE) structure permitted the identification of the contribution of the depletion layer under various bias potentials. Careful measurements using p-Si in a HCl solution within the potential range from 0 to -1 V vs SCE lead to the determination of the corresponding equivalent circuits as a function of the bias potential. Modeling the circuit as a Constant Phase Element (CPE) proved that the imaginary component was a pure capacitor Csc in parallel with a pure resistance RSC. Experimental data showed that these two components undergo a steep variation when the system approaches the silicon flatband potential situation. In this case, a novel fundamental development is presented, assuming that the gradient of potential inside the material is small enough for a simplified treatment based on the linearization of the exponential function. The steep increase in the vicinity of the flatband potential of both the space charge capacitance and conductance was confirmed. It constitutes a useful tool for electrochemical studies to determine the flatband potential and then the band curvature as a function of the sample potential measured vs the SCE reference electrode.
机译:在半导体/氧化物/电解质(SOE)结构中硅衬底的零电流阻抗允许识别耗尽层在各种偏置电位下的贡献。在电位范围内的HCL溶液中使用P-Si的仔细测量从0到-1V VS SCE导致相应的等效电路的确定作为偏置电位的函数。根据恒定相位元素(CPE)建模电路证明了假想组分是与纯电阻RSC平行的纯电容器CSC。实验数据表明,当系统接近硅流带势情况时,这两个组件经历了陡峭变化。在这种情况下,提出了一种新的基本发展,假设材料内部的电位梯度足够小,以基于指数函数的线性化的简化处理。确认了空间电荷电容和电导的平带电位附近的陡峭增加。它构成了用于电化学研究的有用工具,以确定流带电位,然后作为测量样本电位的函数测量的频带曲率,从而测量了VS SCE参考电极。

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