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Excellent field emission from carbon nanotubes grown by microwave-heated chemical vapor deposition

机译:通过微波加热的化学气相沉积生长的碳纳米管的优异场发射

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We have developed a microwave-heated chemical vapor deposition process for growth of carbon nanotubes (CNTs) utilizing a SiC susceptor to absorb microwave energy, heating the substrate much faster than conventional means. Such a process possesses good scaling-up capability to large area deposition with excellent uniformity. Among the growth parameters encountered in this process, the catalyst preparation and the microwave power are very crucial in controlling the morphology and the physical dimension of CNTs, thus affecting their field-emission characteristics. This paper presents our efforts in studying the effect of Ni layer thickness and applied microwave power on the field-emission properties of CNTs grown by the microwave-heated CVD (MH-CVD) process.
机译:我们开发了一种用于使用SiC粘接器的碳纳米管(CNT)生长的微波加热的化学气相沉积方法,以吸收微波能量,从常规手段加热基板。这种过程具有良好的缩放能力,以具有优异的均匀性。在该过程中遇到的生长参数中,催化剂制剂和微波功率对于控制CNT的形态和物理尺寸非常重要,从而影响其现场排放特性。本文介绍了研究Ni层厚度和应用微波功率对由微波加热的CVD(MH-CVD)工艺生长的CNT的现场排放性能的努力。

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