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MOVPE Synthesis of InGaP Quantum Dots on GaP and their Characterisation

机译:MOVPE合成INGAP量子点对间隙及其表征

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We report the growth of InGaP quantum dots on nominally oriented (100) GaP substrates by metalorganic vapour phase epitaxy in Stranski-Krastanow mode. Various growth parameters such as a) growth temperature, b) thickness of InGaP layer, c) Indium content in the InGaP layer, d) growth rate and e) post growth ripening time have been varied to achieve dot density greater than 10~(10)/cm~2 with dot dimensions ~50 nm diameter and ~5 nm height. Surface photovoltage spectroscopy is shown to be a convenient and sensitive technique to monitor the various stages of the growth of quantum dots.
机译:我们在斯特拉斯基 - 克拉特鲸模式下通过金属有机气相外延报告了InGaP量子点对标称取向的(100)间隙底物的生长。各种生长参数,如)生长温度,b)摄入层厚度,C)铟含量在摄食层,d)生长速率和e)后生长成熟时间已经变化,以实现大于10〜(10的点密度)/ cm〜2,点尺寸〜50nm直径〜5 nm。表面光伏光谱显示为一种方便敏感的技术,用于监测量子点生长的各个阶段。

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