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SURFACE MODIFICATION OF GRAPHITE TARGETS BY INTENSE PULSED ION BEAM IRRADIATION

机译:强脉冲离子束照射的石墨靶的表面改变

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High-density, high-pressure ablation plasma produced by intense pulsed ion beam has been used to modify the graphite target surface. The graphite targets were irradiated by 60 - 100 J/cm2 of ion beam. The behavior of ablation plasma was observed by high-speed photography. The kinetic energy of the carbon atoms in the plasma was estimated to be 14 eV/atom at the 100 J/cm2 of ion beam irradiation. Structure of the irradiated targets was investigated by Raman spectroscopy and X-ray diffractometry. We found that either graphite structure or crystallite size in the targets was changed by the ion beam irradiation.
机译:通过强脉冲离子束产生的高密度,高压消融等离子体已被用于改变石墨靶表面。将石墨靶通过60-100J / cm2离子束照射。通过高速摄影观察到烧蚀等离子体的行为。估计等离子体中的碳原子的动能在100J / cm 2的离子束照射下为14eV /原子。通过拉曼光谱和X射线衍射测定研究辐照靶的结构。我们发现,在离子束照射中改变了目标中的石墨结构或微晶尺寸。

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