Excimer Laser as a Total Light Source Solution for DUV Microlithography

摘要

Excimer lasers are now being used in the manufacturing of ultra-large scale integrated devices that require feature widths of less than 0.25mum. The excimer laser for microlithography, since its introduction in 1987 has evolved from a laboratory instrument to a manufacturing tool. We will trace the history of the excimer laser in this industry and explain why it is and remains the total solution for the present and for many years in the future.