Laser divergence manipulator for laser light source for projection exposure system for use in microlithography, has beam moving unit for local variation of laser beam relative to target area, so that beam cross-section is displaced

摘要

The manipulator provides a laser beam that is guided by a laser light source to a target area, and whose divergence is different over the laser beam cross-section transverse to the beam direction. A beam moving unit is provided for the local variation of the laser beam relative to the target area, so that the laser beam cross-section is displaced relative to the target area. A rotatable plane-parallel plate, a rotatable and linearly displaceable beam deflection unit and two rotatable cooperating beam deflection units are provided in the beam moving unit. An independent claim is included for a method for operating laser divergence manipulator.