Amorphous-Nanocrystalline Silicon Plasma Enhanced CVD Grown on Porous Alumina Substrate

摘要

The novel composite amorphous/nanocrystalline thin-film silicon has been fabricated by plasma-enhanced CVD using template porous alumina substrate. The layers possess of specific non-planar morphology and contain silicon nanocrystals of 2-4nm diameter, as well as "bunches" of elongated nanocrystals composing honeycomb-like net. The results obtained could be used in new composite materials and structures for photovoltaics, photonics and ionics.