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Electrodeposition and pulsed laser deposition for CDTE and Cd{sub}xHg{sub}(1-x)Te thin films

机译:CDTE和CD {SUB} XHG {SUB}(1-x)TE薄膜的电沉积和脉冲激光沉积

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CdTe and Cd{sub}xHg{sub}(1-x)Te (CMT) thin films were grown by cathodic electrodeposition and pulsed laser deposition (PLD). Ellipsometry, XRD and XPS analysis techniques were used. For Cd{sub}xHg{sub}(1-x)Te samples with 1-x = 0 and ~0.1 were studied. Different concentrations of [Hg{sup}+2] in the electrolyte lead to films with diverse Cd and Hg contents and diverse kind of oxidizing. XPS reveals that a surface layer ~20 A thick of native oxide (TeO{sub}2, CdO, CdTeO{sub}3) is formed after electrodeposition. Hg segregates strongly to the native oxide layer and appears to influence on its amount and nature. For PLD samples of CdTe, a surface oxide layer was only ~8 A thick. For this samples, smaller oxidation and much smaller incorporation of OH{sup}- were observed. XRD reveals that CdTe and CMT are polycrystalline with <111> as a preferential orientation in electrodeposited and PLD samples. PLD technique presents a better crystalline structure when the substrate temperature is increased up to 240°C. This effect is also got by controlling the energy of the laser pulse. Values for Absorption coefficient are similar in both techniques up to 2 eV, then PLD samples get the highest values (near 10{sup}6 cm{sup}-1). The substrate temperature and the energy of the laser pulse are variables that correctly adjusted produce films with absorption curves closer to that of the single crystal. An additional absorption broad structure appear when the substrates are heated to 240°C before deposition
机译:通过阴极电沉积和脉冲激光沉积(PLD)生长Cdte和Cd {Sub} XHG {Sub}(1-x)Te(CMT)薄膜。使用椭圆测定法,XRD和XPS分析技术。对于CD {Sub} XHG {Sub}(1-x)TE样品,具有1-x = 0和〜0.1。电解液中的不同浓度的[Hg {sup} +2]导致具有多样化的Cd和Hg含量的薄膜和不同类型的氧化。 XPS显示在电沉积之后形成表面层〜20厚的天然氧化物(TEO {Sub} 2,CDO,CDTeo {Sub} 3)。 HG对天然氧化物层偏离,似乎影响其量和性质。对于CdTe的PLD样品,表面氧化物层仅〜8°厚。对于该样品,观察到较小的氧化和少掺入OH {SUP} - 被观察到。 XRD显示CDTE和CMT是具有<111>作为电沉积和PLD样品中的优先取向的多晶。当衬底温度增加至240℃时,PLD技术呈现更好的结晶结构。通过控制激光脉冲的能量,还可以获得这种效果。吸收系数的值在两种技术中相似,两种技术相似,然后PLD样本获得最高值(近10°} 6cm {sup} -1)。基板温度和激光脉冲的能量是正确调节的产生膜,其具有更接近单晶的吸收曲线的产生膜。当基材在沉积之前将基材加热至240℃时,出现额外的吸收宽结构

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