It has been reported that occasionally Tungsten plug core can be electrochemically corroded after metal etching and solvent stripping. The reason is possibly due to an electrical charging phenomenon. This has brought up concerns for misaligned contacts and vias. In this report we have investigated the effects of etching parameters on Tungsten plug loss. Plasma source power, gas flow ratio, pressure and bias power were varied in this experiment. The plasma potential and the plug loss level were measured. The results show similar trends between plasma potential and w plug loss.
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