Executive Summary: This paper focuses on an improved and unique method for optimizing CMP process parameters. RSM experimental designs are used to study the effect of input parameters on the removal rate at radial points of the wafer (removal rate profiles). Multiple linear regrssion models [GSeo. Box, W.G. Hunter, J.S.Hunter "statistics for Experimenters"] are used to establish the removal rate function at each radius. Once the coefficients and equations are established, input parameters are hypothetically varied until machine set points are found resulting in the flattest possible profile or one matching the incoming film porifle. The Sover feature in Excel spreadsheets quickly finds possible set points. The method is useful for engineering processes, validation designs, and providing supporting data or theories of operation.
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