An improvement of oxide CMP process performance through the head design

机译：通过头部设计改善氧化物CMP工艺性能

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This study shows the improvement of the oxide CMP process performance from the modification of the floating polish head. The best WIWNU

机译：该研究表明，从浮动抛光头的改性改善氧化物CMP工艺性能。最好的wiwnu

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《International chemical-mechanical planarization for ULSI multilevel interconnection conference》|2000年||共4页
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Huey-Ming Wang; Gerry Moloney; mario Stella; Sesinando DeGuzman;
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4. An improvement of oxide CMP process performance through the head design [C] . Huey-Ming Wang, Gerry Moloney, mario Stella, International chemical-mechanical planarization for ULSI multilevel interconnection conference . 2000

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An improvement of oxide CMP process performance through the head design

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