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A comparative study of SILC transient characteristics and mechanisms in FN stressed and hot hole stressed tunnel oxides

机译:硅隙瞬态特性的比较研究及FN压力和热孔应力隧道氧化物

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摘要

The mechanisms and transient characteristics of hot hole stress and FN stress induced excess leakage currents in tunnel oxides are investigated. Hot hole SILC is found to have a more pronounced transient effect. The transient is attributed topositive oxide charge detrapping and thus annihilation of positive charge-assisted tunneling current. The positive charge assisted tunneling current can be annealed by substrate hot electron injection. The DC and transient components in FN SILC are alsodiscussed.
机译:研究了热孔应力和FN应力诱导的隧道氧化物中的过滤电流的机制和瞬态特性。发现热孔硅胶具有更明显的瞬态效果。瞬态是归因于卓越的氧化物电荷旋转,从而湮灭正电荷辅助隧道电流。正电荷辅助隧道电流可以通过基板热电子注入来退火。 FN Silc中的DC和瞬态组件是Alsodiscussed。

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