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New way to enhance the uniformity of self-organized InAs quantum dots

机译:增强自组织INAS量子点均匀性的新方法

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Growth interruption was introduced after the deposition of GaAs cap layer which is thinner than the mean height of Quantum dots.Uniformity of quantum dots has been enhanced because the full width of half maximum of photoluminescence decrease from 80meV to 27meV in these samples as the interruption time increasing from 0 to 120 second.Meanwhile,we have observed that the peak position of photoluminescence is a function of interruption time.This effect can be used to control the energy level of quantum dots.The phenomena mentioned above can be attributed to the diffusion of In atoms from the top of InAs islands to the top of GaAs cap layer caused by the difference of surface energies between InAs and GaAs.
机译:在比量子点的平均高度缩小的GaAs帽层沉积之后引入了生长中断。由于量子点的平均高度已经提高,因为在这些样本中的80mev至27mev中的半个大部分的全宽度从这些样本中的中断时间减小到27mev。从0到120秒增加。虽然,我们观察到光致发光的峰值位置是中断时间的函数。该效果可用于控制量子点的能级。上述现象可以归因于扩散在从InAs岛顶部的原子到GaAs盖层顶部,由INAS和GaAs之间的表面能差异引起。

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