首页> 外文会议>International Semicomductor Conference >The influence of the substrate temperature during the pulse laser deposition on the YBCO thin films reviled by A.F.M.
【24h】

The influence of the substrate temperature during the pulse laser deposition on the YBCO thin films reviled by A.F.M.

机译:脉冲激光沉积期间衬底温度对A.F.M的旋转薄膜的影响

获取原文

摘要

The results obtained by Atomic Force Microscopy (AFM) characterisation of high temperature superconducting (HTcS) YBCO thin films, Pulse Laser Deposited (PLD) on heated LaAlO{sub}3 substrate, are presented, An excimer KrF laser beam was used forthe thin film PLD (ablation) in reactive vacuum. The analysed thin films were grown on the same substrate which, because of the glue, was at different thermal conditions. It was found that the film with just a bit lower substrate temperature has notcompletely switched to the orthorhombic structure and the electrical characteristics of the two thin films species result significantly different.
机译:通过原子力显微镜(AFM)高温超导(HTCS)YBCO薄膜,脉冲激光沉积(PLD)在加热的LAALO {SUB} 3衬底上表现出来的结果,薄膜使用了准分子KRF激光束在反应性真空中的PLD(消融)。将分析的薄膜在相同的基材上生长,因为胶水,在不同的热条件下。结果发现,具有钻头较低的基板温度的薄膜并不转换为正交结构,两种薄膜物种的电特性显着不同。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号