Synthesis of SrSnO_3 thin films by pulsed laser deposition: Influence of substrate and deposition temperature

摘要

SrSnO_3 thin films were prepared by pulsed laser deposition on amorphous silica and single crystal substrates of R-sapphire, (100)LaAlO_3 and (100)SrTiO_3. High quality epitaxial (100) oriented films were obtained on LaAlO_3 and SrTiO_3 while a texture was revealed for films on sapphire deposited at the same deposition temperature of 700 ℃. Amorphous films were obtained on silica but a post annealing at 800 ℃ induced crystallization with a random orientation. The screening of deposition temperature showed epitaxial features on SrTiO_3 from 650 ℃ while no crystallization was observed at 600 ℃. The influence of substrate and deposition temperature was confirmed by Scanning Electron Microscopy and Atomic Force Microscopy observations.