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Imaging interferometric lithography: extending optics to fundamental limits and beyond

机译：成像干涉式光刻：将光学延伸到基本限制和超越

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Abstract not available.

机译：摘要不可用。

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《Congress of the international commission for optics: Optics for the next millennium》|1999年||共2页
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作者
Steven R. Brueck;
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中图分类光学;
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专利

1. Simulation of the 45-nm half-pitch node with 193-nm immersion lithography-imaging interferometric lithography and dipole illumination [J] . Abani Biswas, Steven R. J. Brueck Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第1期

机译：用193nm浸没式光刻成像干涉光刻和偶极子照明对45nm半节距节点进行仿真
2. Simulation of the 45-nm half-pitch node with 193-nm immersion lithography-imaging interferometric lithography and dipole illumination [J] . Abani Biswas, Steven R. J. Brueck Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第1期

机译：用193nm浸没式光刻成像干涉光刻和偶极子照明对45nm半节距节点进行仿真
3. Stimulated emission reduced fluorescence microscopy: a concept for extending the fundamental depth limit of two-photon fluorescence imaging [J] . Lu Wei, Zhixing Chen, Wei Min Biomedical Optics Express . 2012,第6期

机译：受激发射减少荧光显微镜：扩展双光子荧光成像的基本深度极限的概念
4. Imaging interferometric lithography: extending optics to fundamental limits and beyond [C] . Steven R. Brueck Congress of the international commission for optics: Optics for the next millennium . 1999

机译：成像干涉式光刻：将光学延伸到基本限制和超越
5. A study of interferometric lithography: Approaching the linear system limits of optics. [D] . Chen, Xiaolan. 1998

机译：干涉光刻的研究：接近光学系统的线性系统极限。
6. Stimulated emission reduced fluorescence microscopy: a concept for extending the fundamental depth limit of two-photon fluorescence imaging [O] . Lu Wei, Zhixing Chen, Wei Min 2012

机译：受激发射减少荧光显微镜：扩展双光子荧光成像的基本深度极限的概念
7. Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" [O] . Steuernagel, Ole 2003

机译：评“量子干涉光学光刻：开发缠绕衍射极限的纠缠“

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