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Effect and Optimization of CdS/CdTe Interdiffusion on CdTe Electrical properties and CdS/CdTe Cell Performance

机译:CDS / CDTE间跨对CDTE电性能和CDS / CDTE细胞性能的影响及优化

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We have investigated the effect of the CdS/CdTe interdiffusion on the properties of the CdTe films and the CdS/CdTe cell performance. Sulfur (S) diffusion into the CdTe films leads to a decreased defect density in the films, improvement of cell performance, and possibly to the increase of the carrier lifetime in the films. Cell performance is improved with the increase of the amount of S in the CdTe films. S diffusion into CdTe also deteriorates the uniformity of the CdW window layers, resulting in worse cell performance. Based on this study, we propose a processing method to improve cell performance.
机译:我们研究了CDS / CDTE间隔对CDTE膜的性能和CDS / CDTE细胞性能的影响。硫(S)扩散到CdTe膜中导致薄膜中的缺陷密度降低,改善细胞性能,并且可能在薄膜中增加载体寿命。随着CdTe薄膜中的S的量增加,细胞性能得到改善。 S扩散到CDTE也劣化了CDW窗层的均匀性,从而导致更差的细胞性能。基于这项研究,我们提出了一种改善细胞性能的加工方法。

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