首页> 外文会议>Asia Pacific Microwave Conference >An Analytical Drain Current Model for AlGaN/GaN Metal Insulator Semiconductor Heterostructure Field Effect Transistor (MISHFET): A Comparative Study with Conventional HFETs for High Power Microwave Applications
【24h】

An Analytical Drain Current Model for AlGaN/GaN Metal Insulator Semiconductor Heterostructure Field Effect Transistor (MISHFET): A Comparative Study with Conventional HFETs for High Power Microwave Applications

机译:AlGaN / GaN金属绝缘体半导体异质结构场效应晶体管的分析漏极电流模型(MISHFET):具有高功率微波应用的传统HFET的比较研究

获取原文

摘要

An analytical drain current model of a novel device architecture-^sAlGaN/GaN Metal Insulator Semiconductor Heterostructure Field Effect Transistor (MISHFET) has been presented to assess the microwave performance of the device for sub micron gate lengths. T
机译:已经提出了一种新颖的设备架构 - 硒施工 - ^ Salgan / GaN金属绝缘体半导体异质结构场效应晶体管(MISHFET)的分析漏极电流模型,以评估用于子微米栅极长度的装置的微波性能。 T.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号