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Total dose and RT annealing effects on startup current transient in antifuse FPGA

机译:对Atfuse FPGA的启动电流瞬态的总剂量和RT退火效应

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The startup current in an antifuse field programmable gate array (FPGA) device, A1280A, is investigated in the context of ionizing radiation effects. If properly measured, a radiation induced startup transient (RIST) can be identified after certain amount of irradiation. RIST increases with total dose (TID), and is strongly dependent on the dose rate. Room-temperature biased annealing for few days can reduce RIST to a very low level. A transistor-level mechanism is proposed to elucidate the origin of RIST. The ionization induced leakage in the NMOS diode is believed to be the root cause. The degradation of the ramping speed of the charge pump causes RIST when powering up the device. SPICE simulation was also performed to demonstrate the slow down of the ramping speed by the leakage in the NMOS diode. In typical low-dose-rate space environments, RIST is not the limiting factor for the total dose tolerance.
机译:在电离辐射效应的背景下,研究了反熔丝现场可编程门阵列(FPGA)设备A1280A的启动电流A1280A。如果正确测量,可以在一定量的照射后识别辐射诱导的启动瞬态(RIST)。 rist随着总剂量(TID)而增加,并且强烈依赖于剂量率。房间 - 温度偏见退火几天可以减少狂热到一个非常低的水平。提出了晶体管级机制来阐明rist的起源。据信,NMOS二极管中的电离诱导泄漏是根本原因。电荷泵的升高速度的劣化导致频率在供电时。还进行了香料仿真以通过NMOS二极管的泄漏来证明斜坡速度的慢速度。在典型的低剂量空间环境中,RIST不是总剂量耐受性的限制因素。

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