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Response of SIMOX and unibond buried oxides: trapping and detrapping properties

机译:SIMOX和UNIBOND埋氧的响应:捕获和脱滴性质

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摘要

X-ray induced charge trapping and detrapping properties are investigated in SIMOX and Unibond buried oxides. A very deep trapping of both holes and electrons is evidenced in these materials. The importance of electron compensation, both during irradiation and anneal, is shown to determine the anneal properties.
机译:在SIMOX和UNIBOND掩埋氧化物中研究了X射线诱导的电荷捕获和褪色性能。在这些材料中证明了对孔和电子的非常深的诱捕。显示在照射和退火期间电子补偿的重要性,显示出确定退火性能。

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